Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley; Jong Keun Park; Emad Aqad; Yinjie Cen; Li Cui; Conner Hoelzel; Benjamin D. Naab; Maria Melanson; Hung Tran; Stefan Alexandrescu; Rochelle Rena; Jason Behnke; Karen E. Petrillo

doi:10.1117/12.3010919

10 April 2024 Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin D. Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen E. Petrillo

Author Affiliations +

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571Y (2024) https://doi.org/10.1117/12.3010919
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

We report on the relationship between resist make-up, filtration process & CH AEI defectivity for an advanced CAR resist with fast dose. In particular, the effect of a pattern transfer scheme on a resist platform with formulation & filtration variation is examined. Resist design & manufacturing strategies for continuous improvement of EUV CAR lithographic performance will be discussed.

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Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin D. Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, and Karen E. Petrillo "Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571Y (10 April 2024); https://doi.org/10.1117/12.3010919

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