Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators

Jayoung Koo; YunJi Kim; You Rim Shin; HyunHo Yoon; Philjae Kang; Ye Ri Han; Jong Keun Park; Karen Petrillo; Jae Hwan Sim

doi:10.1117/12.3010977

9 April 2024 Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators

Jayoung Koo, YunJi Kim, You Rim Shin, HyunHo Yoon, Philjae Kang, Ye Ri Han, Jong Keun Park, Karen Petrillo, Jae Hwan Sim

Author Affiliations +

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 129571C (2024) https://doi.org/10.1117/12.3010977
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

For designing high-resolution integrated circuits, extreme ultraviolet (EUV) lithography using 13.5-nm light is indispensable; however, stochastic issues which can result in pattern roughness and stochastic defects have yet to be resolved. Many of these issues can relate to the low photon density when compared to DUV lithography. To resolve stochastic concerns in chemically amplified (CA) photoresists, it is important to use appropriate photoacid generator (PAG). EUV PAGs are designed to capture secondary electrons that originate from EUV irradiation to the photoresists. Herein, we focused on in silico analysis of C-S bond cleavage of sulfonium cation series, which is a well-known mechanism in production of photogenerated acids. Change in cation types or substituted functional groups directly affect electron affinities of PAG cations, as well as the efficiency of C-S bond cleavage reaction. Finally, the correlation between actual lithographic performance and calculated properties was carried out to understand the factors that influence efficiency of photoacid generation.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jayoung Koo, YunJi Kim, You Rim Shin, HyunHo Yoon, Philjae Kang, Ye Ri Han, Jong Keun Park, Karen Petrillo, and Jae Hwan Sim "Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129571C (9 April 2024); https://doi.org/10.1117/12.3010977

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available