High-precision nanopositioning and nanomeasuring machines for alternative nanofabrication

Ingo Ortlepp

doi:10.1117/12.3010844

9 April 2024 High-precision nanopositioning and nanomeasuring machines for alternative nanofabrication

Ingo Ortlepp

Proceedings Volume 12956, Novel Patterning Technologies 2024; 129560D (2024) https://doi.org/10.1117/12.3010844
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

For two decades, the Technische Universität Ilmenau has been developing high precision Nanopositioning and Nanomeasuring machines (NPMMs). These have proven their potential for nanometer accurate measurements in large volumes up to 200mm x 200mm x 25mm with 5 axis operation in several fields. As these machines operate according to the highest standards of metrology, offer picometer resolution and nanometer uncertainty, the goal is to transfer their unique precision to fabrication and patterning. So far, the NPMMs have been equipped with laser-based as well as tip-based patterning tools, including one photon and two photon polymerization, nanoimprint, scanning probe lithography and combinations of these technologies. The goal is basic research on these technologies, to tackle the evident challenges and explore the concealed limits to estimate the potential for later use in an industrial scale. In this paper, the specifics and advantages of the NPMMs will be described as well as the micro- and nanofabrication tools that are currently worked on. Focus is on the parameters in measurement mode and the accomplished fabrication results.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Ingo Ortlepp "High-precision nanopositioning and nanomeasuring machines for alternative nanofabrication", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560D (9 April 2024); https://doi.org/10.1117/12.3010844

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