Grayscale lithography (GL) is a well-suited technique to manufacture 3D micro objects, such as micro-lens, in a single lithography step. The current method to realize GL masks is limited to square pattern masks and suffers from a high computational cost. This article introduces a deep learning workflow to generate free-form masks for GL. The proposed workflow is composed of five main steps: the dataset generation, the neural network training and inference, the post-treatment and its evaluation. With this method, quality index for 3D simulated objects is equivalent to the current iterative computational method and the computation time is reduced at the same time.
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