Poster + Paper
12 March 2024 Highly nonlinear behavior of UV-curable photopolymer under elastomer-templated low-pressure nanoimprinting
Author Affiliations +
Proceedings Volume 12899, MOEMS and Miniaturized Systems XXIII; 128990N (2024) https://doi.org/10.1117/12.3001841
Event: SPIE OPTO, 2024, San Francisco, California, United States
Conference Poster
Abstract
Understanding the dynamic behavior of photopolymers in nanoscale environment is essential to improving MEMS/NEMS device fabrication technologies. Here, we unveil the highly nonlinear behaviors of photopolymers exhibited during the process of light-controlled, low-pressure nanoimprinting. Such peculiarities can complicate the relation between the UV-dose and the height of the nanoimprinted feature, degrading the accuracy of the height control. To address the issue, we establish a theoretical process model and used the control of the nanoimprinting height for structural coloring applications. Our findings will broadly benefit nanotechnology and nanoscience.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Myung Gi Ji, Rabiul Islam Sikder, and Jaeyoun Kim "Highly nonlinear behavior of UV-curable photopolymer under elastomer-templated low-pressure nanoimprinting", Proc. SPIE 12899, MOEMS and Miniaturized Systems XXIII, 128990N (12 March 2024); https://doi.org/10.1117/12.3001841
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KEYWORDS
Ultraviolet radiation

Fabrication

Polymers

Modulation

Liquids

Positive feedback

Process modeling

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