Enhancement of simulation and design for ideal overlay with target asymmetry using COMSOL multiphysics

Doogyu Lee; Hyoung Won Baac

doi:10.1117/12.3001644

13 March 2024 Enhancement of simulation and design for ideal overlay with target asymmetry using COMSOL multiphysics

Doogyu Lee, Hyoung Won Baac

Proceedings Volume 12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII; 128980P (2024) https://doi.org/10.1117/12.3001644
Event: SPIE OPTO, 2024, San Francisco, California, United States

Conference Poster

Abstract

Overlay in upper layer with respect to lower layer need to be measured and controlled with sub-nanometer-level accuracy in semiconductor manufacturing process. However, as the Metrology To Device (MTD) deviation continues to increase, there is a growing need to maintain and improve MTD variation. In this study, we propose a methodology utilizing COMSOL Multiphysics to directly track process changes and quantify their impact. It can realize actual measurement equipment setting and modify optical property. We will introduce device matching methods that can improve MTD on product wafers through optical simulations.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Doogyu Lee and Hyoung Won Baac "Enhancement of simulation and design for ideal overlay with target asymmetry using COMSOL multiphysics", Proc. SPIE 12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, 128980P (13 March 2024); https://doi.org/10.1117/12.3001644

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