Evaluation of the ATEQ CORE-2000 reticle writer

Gary A. Burns; James A. Schoeffel; Reed Welch

doi:10.1117/12.3011920

12 October 2023 Evaluation of the ATEQ CORE-2000 reticle writer

Gary A. Burns, James A. Schoeffel, Reed Welch

Proceedings Volume 12810, Bay Area Chrome Users Society Symposium 1986; 1281009 (2023) https://doi.org/10.1117/12.3011920
Event: 6th Annual BACUS Symposium, 1986, Santa Clara, CA, United States

Abstract

ATEQ Corporation has developed a scanning laser lithography system for use in "state-of-the-art” 5X reticle manufacturing. This system, the C0RE-2000, exposes optical photoresist and can write a typical reticle in less than 20 minutes. Its lithography performance is comparable to presently used electron beam systems but offers higher throughputs and lower costs. This paper presents the results of a detailed evaluation of the CORE-2000 including registration performance, critical dimension control, and throughput. Registration performance and critical dimension control were measured by means of a Nikon 21 Lampas system. System throughput was measured by writing a variety of device patterns, and was compared to the throughput of existing lithography systems.

Citation Download Citation

Gary A. Burns, James A. Schoeffel, and Reed Welch "Evaluation of the ATEQ CORE-2000 reticle writer", Proc. SPIE 12810, Bay Area Chrome Users Society Symposium 1986, 1281009 (12 October 2023); https://doi.org/10.1117/12.3011920

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