Photolytic CVD for one-step photomask repair

Shunji Kishida; Yoichi Yoshino

doi:10.1117/12.3011916

12 October 2023 Photolytic CVD for one-step photomask repair

Shunji Kishida, Yoichi Yoshino

Proceedings Volume 12810, Bay Area Chrome Users Society Symposium 1986; 1281006 (2023) https://doi.org/10.1117/12.3011916
Event: 6th Annual BACUS Symposium, 1986, Santa Clara, CA, United States

Abstract

A laser based photolytic CVD Mask Repair System YL454A, capable of quickly and reliably repairing both clear and opaque defects, has been developed. For clear defect repairing, adhesive micrometer size chromium film of sharp-edged arbitrarily-sized rectangles, can be deposited in the opposite manner of conventional laser zapping process.

Citation Download Citation

Shunji Kishida and Yoichi Yoshino "Photolytic CVD for one-step photomask repair", Proc. SPIE 12810, Bay Area Chrome Users Society Symposium 1986, 1281006 (12 October 2023); https://doi.org/10.1117/12.3011916

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available