Paper
10 October 2023 Pellicles and alternative mask materials
Ron Herschel
Author Affiliations +
Abstract
I will emphasize in this presentation the pellicle protection problem, for I think that's a relevant subject for the audience today. This is a 2.85 micron pellicle. Perhaps it's had as much impact on yield improvement with Perkin Elmer Aligners as any other single innovation in the lithography tooling industry in the last ten years. This pellicle was made out of nitrous cellulose which has a high degree of uniformity and a low haze as we'll discuss later.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ron Herschel "Pellicles and alternative mask materials", Proc. SPIE 12806, Bay Area Chrome Users Society Symposium 1982, 1280609 (10 October 2023); https://doi.org/10.1117/12.3011306
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