Paper
28 November 2023 Comparative research of mirror systems for extreme ultraviolet lithography illuminator
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Abstract
Illuminator is one of the important components of extreme ultraviolet lithography system. Industrial extreme ultraviolet lithography illuminator uses two compound eyes and relay system, which can realize variety of illumination modes. But the manufacture and assembly of compound eyes are difficult. Therefore, we would like to design illuminators, which use such as Offner-relay system, quad elliptical mirrors, or other mirror systems. These systems do not have more complex surfaces, easier to assembly. Analyze advantages and disadvantages of these systems, and then discuss the possibility of using these systems in industrial extreme ultraviolet lithography.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Shan Gao, Elena A. Tsyganok, and Galina E. Romanova "Comparative research of mirror systems for extreme ultraviolet lithography illuminator", Proc. SPIE 12765, Optical Design and Testing XIII, 127650F (28 November 2023); https://doi.org/10.1117/12.2686671
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KEYWORDS
Mirrors

Lithographic illumination

Extreme ultraviolet lithography

Design and modelling

Light sources and illumination

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