Improving overlay performance through enhanced stage positioning accuracy

James Prince; Victor David; Diana Poullos; Larry Zurbrick

doi:10.1117/12.2687910

21 November 2023 Improving overlay performance through enhanced stage positioning accuracy

James Prince, Victor David, Diana Poullos, Larry Zurbrick

Proceedings Volume 12751, Photomask Technology 2023; 127511G (2023) https://doi.org/10.1117/12.2687910
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Stage positioning accuracy in mask writers and metrology equipment is typically stated as a single number by equipment manufacturers (average plus 3-sigma value). The error budget that constitutes this specification is seldom discussed with equipment purchasers and is usually confined to the equipment manufacturer and their suppliers. Interferometer subsystems consist of multiple technical disciplines including stable wavelength laser technology, optomechanics (interferometers), detectors, electronics, and algorithms (phase measurement and interface electronics). Each technology has significantly advanced since the introduction of laser interferometry on mask and wafer lithography and metrology equipment. This paper discusses the error budget related to the interferometry subsystem and possible improvements to this subsystem going forward.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

James Prince, Victor David, Diana Poullos, and Larry Zurbrick "Improving overlay performance through enhanced stage positioning accuracy", Proc. SPIE 12751, Photomask Technology 2023, 127511G (21 November 2023); https://doi.org/10.1117/12.2687910

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