Paper
18 July 2023 Movement-controllable bubble transportation in an aqueous environment on wedge-shaped wettability pattern
Song Zhang, Tao Wang, Junyi Lin, Defeng Yan, Jinlong Song
Author Affiliations +
Proceedings Volume 12744, Second International Conference on Advanced Manufacturing Technology and Manufacturing Systems (ICAMTMS 2023); 127442N (2023) https://doi.org/10.1117/12.2689105
Event: Second International Conference on Advanced Manufacturing Technology and Manufacturing Systems (ICAMTMS 2023), 2023, Nanjing, China
Abstract
The manipulation of underwater bubble using the superwetting surface is crucial for industrial and scientific research. However, most of the superwetting surfaces are not able to achieve precise control for underwater bubble transportation. Here, a new method was proposed to construct a superaerophobic wedge pattern on superaerophilic wedge surface for precise underwater bubble transportation. The pattern was fabricated on the aluminum plate for underwater bubble transportation by the secondary laser etching and fluoroalkylsilane modification techniques. In this study, the wedge angle and the length of superaerophobic wedge pattern were investigated for the underwater bubble transportation on the superaerophilic wedge surface, and the results showed that the transportation distance of underwater bubbles could be precisely controlled by adjusting the wedge angle and the length of superhydrophobic wedge pattern.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Song Zhang, Tao Wang, Junyi Lin, Defeng Yan, and Jinlong Song "Movement-controllable bubble transportation in an aqueous environment on wedge-shaped wettability pattern", Proc. SPIE 12744, Second International Conference on Advanced Manufacturing Technology and Manufacturing Systems (ICAMTMS 2023), 127442N (18 July 2023); https://doi.org/10.1117/12.2689105
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KEYWORDS
Bubbles

Transportation

Aluminum

Etching

Image processing

Digital image processing

Resistance

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