Paper
1 August 1990 Ellipsometry of thin uniaxial layers
Andrew Y. Tronin, Valery N. Filippov, Alisa F. Konstantinova, Michael M. Karpuk
Author Affiliations +
Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20389
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands
Abstract
Reviewed are the approaches for the determination of the optical constants - refraction indices, absorption coefficients and thickness of thin uniaxial film with various optical axis orientations, arbitrary among them. The comparative analysis of various measurements - MAI (multi angle of incidence ellipsometry), MTE (multi film thickness ellipsometry), IHE (multi immersion ellipsometry) and MOE (multi orientation ellipsometry) and corresponding techniques for solving the inverse task is given for each type of optical axis orientation.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew Y. Tronin, Valery N. Filippov, Alisa F. Konstantinova, and Michael M. Karpuk "Ellipsometry of thin uniaxial layers", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20389
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KEYWORDS
Ellipsometry

Refraction

Reflection

Anisotropy

Thin films

Refractive index

Silicon films

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