Plasma etching of chrome masks using PBS resist

Guido Bell; H. Spierer

doi:10.1117/12.20225

1 June 1990 Plasma etching of chrome masks using PBS resist

Guido Bell, H. Spierer

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20225
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Standard PBS can be used as a plasma etch mask. In the three layer system PBS /antireflective chrome oxide! chrome the PBS layer only exhibits a strong dependency on temperature. PBS is stabilized by cooling whereas the etch rates of chrome oxide and chrome remain practically unaffected by lowering the temperature. The resulting edge slope of the chrome is thus a function of etch rates of the three layers. A selectivity of 1:1:1 (PBS:CrxOy:Cr) leads to the reproduction of the starting PBS slope into the CrO/Cr slope. Therefore standard PBS structures with the usual flat foot of the Srn-shaped slope need a strong descum step prior to plasma etching.

Citation Download Citation

Guido Bell and H. Spierer "Plasma etching of chrome masks using PBS resist", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20225

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