Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing

Chi-Min Yuan; Andrzej J. Strojwas

doi:10.1117/12.20189

1 June 1990 Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing

Chi-Min Yuan, Andrzej J. Strojwas

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20189
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The aim ofour work was to develop rigorous models to study various optical alignment and metrology schemes implemented in commercial tools. These schemes indude wafer alignment schemes in steppers and linewidth measurement schemes in optical microscopes. A simulator called METRO based on the models developed has been implemented to facilitate this task. Theoretical and experimental verification efforts have been performed to examine the validity of the simulation results and good agreement has been obtained. By utilizing METRO process engineers can gain more insight into the equipment under operation so as to obtain more accurate alignment and measurement results. Also the equation formulation in METRO is general enough so that optics designers can easily adopt or modify the code to help in devising innovative alignment and metrology schemes. 1.

Citation Download Citation

Chi-Min Yuan and Andrzej J. Strojwas "Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20189

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