Image quality of higher NA I-line projection lens

Shinichi Nakamura; Koichi Matsumoto; Kazuo Ushida; Masaomi Kameyama

doi:10.1117/12.20181

1 June 1990 Image quality of higher NA I-line projection lens

Shinichi Nakamura, Koichi Matsumoto, Kazuo Ushida, Masaomi Kameyama

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20181
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

These days much attention is being paid to the potential of i-line lithography. We have manufactured a high numer ical aperture ( N. A. ) i-lme lens in order to study this potential. The lens specification is as follows magnification : 1/10 N. A. : 0. 65 field size : 5X5min. In this paper we first compare the difference between the image quality of g-line and i-line optics with the same resolution and then we present the results of our experiment with the new i-line lens which shows the considerable P055 ibil ity of sub-half micron 1 ithography with an i-l me optical stepper. 1.

Citation Download Citation

Shinichi Nakamura, Koichi Matsumoto, Kazuo Ushida, and Masaomi Kameyama "Image quality of higher NA I-line projection lens", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20181

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