Comprehensive 3-D notching simulator with nonplanar substrates

Eytan Barouch; Brian D. Bradie; Uwe Hollerbach; George Karniadakis; Steven A. Orszag

doi:10.1117/12.20198

1 June 1990 Comprehensive 3-D notching simulator with nonplanar substrates

Eytan Barouch, Brian D. Bradie, Uwe Hollerbach, George Karniadakis, Steven A. Orszag

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20198
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

A comprehensive three-dimensional simulation model for non-planar substrate lithography is presented. Matching substrate as well as standing wave effects are examined. The projection printing is simulated using Hopkins'' results and the exposure model is solved using spectral element discretizations of the nonlinear wave equation coupled with the rate equation for the photoactive compound concentrate evolution. The dissolution algorithm describing moving fronts has been modified to handle various topographies thus yielding the final profiles. Results are presented for several test problems. 1.

Citation Download Citation

Eytan Barouch, Brian D. Bradie, Uwe Hollerbach, George Karniadakis, and Steven A. Orszag "Comprehensive 3-D notching simulator with nonplanar substrates", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20198

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available