Submicron imaging at 248.3 nm: a lithographic performance review of an advanced negative resist

John S. Petersen; Wei Lee

doi:10.1117/12.20127

1 June 1990 Submicron imaging at 248.3 nm: a lithographic performance review of an advanced negative resist

John S. Petersen, Wei Lee

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20127
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

This paper reviews the initial lithographic performance of the Megaposit® SNR 248-1.0 Photo Resist during the imaging of 0.35, 0.40, 0.45, 0.50 and 0.55km line/space pairs on a 0.42NA/0.5 coherence/KrF stepper. The test results show that process window overlap can be maintained to a normalized geometry size of 0.59 ki for line/space pairs. This degree of overlap is shown to be comparable to a normalized value of 0.76 k 1 during the simultaneous imaging of line/space pairs, isolated lines and isolated spaces. This result appears to be consistent with the g-line results published prcviously1 . It is also shown that at the exposure dose required to size the target geometry, the resist induced bias due to lateral development is negligible and provides the possibility to extend the working resolution to smaller geometries if the intensity minimum of the aerial image can be suppressed.

Citation Download Citation

John S. Petersen and Wei Lee "Submicron imaging at 248.3 nm: a lithographic performance review of an advanced negative resist", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20127

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