Image reversal: a new chemical approach using isoureas

James W. Taylor; Thomas L. Brown; David R. Bassett

doi:10.1117/12.20107

1 June 1990 Image reversal: a new chemical approach using isoureas

James W. Taylor, Thomas L. Brown, David R. Bassett

Proceedings Volume 1262, Advances in Resist Technology and Processing VII; (1990) https://doi.org/10.1117/12.20107
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

A dual-tone photoresist that produces positive and negative images has been developed. The chemistry of image reversal is based on novolac-bound isoureas. Isoureas are "blocked" carbodiimides which deblock during postbake to deactivate indenecarboxylic acid groups in the irradiated areas. After postbake, the resist is flood-exposed to convert the remaining photoactive compound in the resist to indenecarboxylic acid groups; development then gives a negative image of the mask.

Citation Download Citation

James W. Taylor, Thomas L. Brown, and David R. Bassett "Image reversal: a new chemical approach using isoureas", Proc. SPIE 1262, Advances in Resist Technology and Processing VII, (1 June 1990); https://doi.org/10.1117/12.20107

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