On-line state and model parameter identification of the positive optical photoresist development process

Thomas A. Carroll; W. Fred Ramirez

doi:10.1117/12.20075

1 June 1990 On-line state and model parameter identification of the positive optical photoresist development process

Thomas A. Carroll, W. Fred Ramirez

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20075
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

The development phase of the optical photolithography process has long been considered the most crucial, as it is the final image-forming step. Process monitoring methods have focused primarily on end point detection, and have not used other inferable on-line information. This paper examines the use ofinathematical models in conjunction with on-line development penetration data to determine process changes. An on-line sequential parameter identification scheme is used to calculate a current rate parameter value for the development model, and a Kalman filter is used to reduce erroneous observations caused by measurement noise. A powerful development monitor system results from the combination of real-time data and on-line parameter and state estimation theory.

Citation Download Citation

Thomas A. Carroll and W. Fred Ramirez "On-line state and model parameter identification of the positive optical photoresist development process", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20075

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