In-situ develop end point control to eliminate CD variance

Mariste Jaffe

doi:10.1117/12.20082

1 June 1990 In-situ develop end point control to eliminate CD variance

Mariste Jaffe

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20082
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Photolithography variables that are still uncontrolled include time between softbake and exposure, time between exposure and develop, relative humidity, and exhaust uniformity. Even if all other variables are in perfect control, these can cause enough variation to put sub-micron CDs out of spec. Changing exposure energies cannot fully compensate. The use of in-situ develop end point control can eliminate CD variance caused by these and other process variations.

Citation Download Citation

Mariste Jaffe "In-situ develop end point control to eliminate CD variance", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20082

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