Impact of reticle defects on submicron 5x lithography

Paolo Canestrari; Samuele Carrera; Giorgio A. L. M. Degiorgis; Vito Visentini

doi:10.1117/12.20049

1 June 1990 Impact of reticle defects on submicron 5x lithography

Paolo Canestrari, Samuele Carrera, Giorgio A. L. M. Degiorgis, Vito Visentini

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20049
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

During past years a lot of efforts were put from several authors in order to approach the problems related to reticle defect printability. Several works analized the physical phenomena affecting the mask imperfection reproducibility and recently it was showed that the impact of reticle defects eeems to increase by going from micron to submicron lithography. The goal at the base of the present work has been to verify these hypothesis by starting from the experience collected in the previous works and by designing targeted experiments in order to classify the real critical impact of the possible important factors.

Citation Download Citation

Paolo Canestrari, Samuele Carrera, Giorgio A. L. M. Degiorgis, and Vito Visentini "Impact of reticle defects on submicron 5x lithography", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20049

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