Paper
6 June 2023 EUV impact on silicon and carbon etching versus deposition
Author Affiliations +
Abstract
In this contribution we share results of our experimental investigations on the role of EUV on carbon and silicon deposition in hydrogen environment. In our experiments we found no signs of EUV induced deposition of silicon. Moreover we show that it is possible to increase the rate of EUV induced deposition of carbon with respect to that of silicon. This could possibly be used to mitigate silicon growth on optical surfaces.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Kurganova, G. Milinkovic, I. Bolk, R. van Lent, and M. van de Kerkhof "EUV impact on silicon and carbon etching versus deposition", Proc. SPIE 12578, Optics Damage and Materials Processing by EUV/X-ray Radiation (XDam8), 125780E (6 June 2023); https://doi.org/10.1117/12.2665932
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KEYWORDS
Silicon

Extreme ultraviolet

Carbon

Ruthenium

Extreme ultraviolet lithography

Etching

Hydrogen

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