Paper
9 January 2023 Study on radial uniformity of large aperture capacitively coupled plasma
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Abstract
We simulated a large-aperture capacitively coupled plasma (CCP) using a two-dimensional fluid model, and explored the effects of radio frequency, electrode power, and gas pressure on the period-averaged electron density and electron temperature. The influence and control ability of various discharge parameters on the plasma uniformity are analyzed, which provides reference for the selection of plasma process parameters.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiang Wu, Bin Fan, Peiqi Jiao, Qiang Xin, and Zhaoyu Liang "Study on radial uniformity of large aperture capacitively coupled plasma", Proc. SPIE 12507, Advanced Optical Manufacturing Technologies and Applications 2022; and 2nd International Forum of Young Scientists on Advanced Optical Manufacturing (AOMTA and YSAOM 2022), 125070A (9 January 2023); https://doi.org/10.1117/12.2653311
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KEYWORDS
Plasma

Electrodes

Etching

Helium

Ionization

Modulation

Numerical simulations

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