Study on irradiation effects by femtosecond-pulsed extreme ultraviolet in resist materials

Yuji Hosaka; Hiroki Yamamoto; Masahiko Ishino; Thanh-Hung Dinh; Masaharu Nishikino; Akira Kon; Shigeki Owada; Yuichi Inubushi; Yuya Kubota; Yasunari Maekawa

doi:10.1117/12.2670220

30 April 2023 Study on irradiation effects by femtosecond-pulsed extreme ultraviolet in resist materials

Yuji Hosaka, Hiroki Yamamoto, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Akira Kon, Shigeki Owada, Yuichi Inubushi, Yuya Kubota, Yasunari Maekawa

Author Affiliations +

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 1249827 (2023) https://doi.org/10.1117/12.2670220
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

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Abstract

Irradiation effects of poly(methyl methacrylate) (PMMA) induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation extreme ultraviolet free electron laser (EUV-FEL) lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. The sensitivity enhancement upon exposure to femtosecond-pulsed SXFEL is similar to the result obtained using laser-induced-plasma based Soft X-ray laser (SXRL) (picosecond-pulsed EUV). This result speculates the reactions induced by femtosecond-pulsed SXFEL and picosecond-pulsed XRL were almost same, but it was different from those induced by nanosecond-pulsed EUV.

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Yuji Hosaka, Hiroki Yamamoto, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Akira Kon, Shigeki Owada, Yuichi Inubushi, Yuya Kubota, and Yasunari Maekawa "Study on irradiation effects by femtosecond-pulsed extreme ultraviolet in resist materials", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249827 (30 April 2023); https://doi.org/10.1117/12.2670220

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