The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu

Renzo Capelli; Klaus Gwosch; Grizelda Kersteen; Matthias Roesch; Carolin Müller; Alexander Winkler; Andreas Verch

doi:10.1117/12.2641531

1 December 2022 The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu

Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, Andreas Verch

Author Affiliations +

Proceedings Volume 12292, International Conference on Extreme Ultraviolet Lithography 2022; 122920N (2022) https://doi.org/10.1117/12.2641531
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Digital Flex Illu is a fully digital solution which provides SMO functionality to the AIMS® EUV system by combining an adaptation of the already built-in system metrology with a powerful algorithm and most importantly, without changing the machine hardware. In this paper, we will present the concept of Digital Flex Illu functionality, its significant advantages in combination with a binary aperture-based illumination concept, together with showing imaging results obtained on the AIMS® EUV prototype system. This digital solution is a paradigm change for the AIMS® EUV usability and final user, it allows ZEISS to guarantee an agile roadmap for the AIMS® EUV with limited development effort and great benefits in sustainability and roadmap scaling.

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Citation Download Citation

Renzo Capelli, Klaus Gwosch, Grizelda Kersteen, Matthias Roesch, Carolin Müller, Alexander Winkler, and Andreas Verch "The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu", Proc. SPIE 12292, International Conference on Extreme Ultraviolet Lithography 2022, 122920N (1 December 2022); https://doi.org/10.1117/12.2641531

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