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As semiconductor industry moves to advanced node, capability to well-control On Product Overlay (OPO) becomes a major task force in HVM environment in recent years. In order to continuously sustain OPO at better production level for critical layers, processing on one dedicated immersion (IMM) scanner is a traditional method to meet the quality purpose. However, the tool dedication method impacts IMM scanner throughput and therefore increases cost of ownership for the manufacturing. The ability of smoothly de-stacking the process layers to other IMM scanner without heavily losing OPO performance levels up the full-route productivity, hence enables the cost down opportunity. In this paper, we present a run-to-run APC control methodology and demonstrate the capability to well predict the model terms for inline production scenarios.
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Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Aijiao Zhu, Ningqi Zhu, Dan Li, Jin Zhu, Jincheng Pei, Kevin Huang, "Overcome machine to machine overlay for better scanner mix-run control," Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205318 (26 May 2022); https://doi.org/10.1117/12.2614372