Overlay stability control in IBO measurement using rAIM target

Nahee Park; Dohwa Lee; Liu Liu; Xuefei Zhou; Hongpeng Su; Dongsub Choi; Wayne Zhou; Hedvi Spielberg; Efi Megged; Chen Dror; Diana Shaphirov; Zephyr Liu; Mark Ghinovker; Dongyoung Lee; Hongbok Yeon; Hyunjun Kim; Sukwon Park; Bohye Kim; Honggoo Lee; Sangho Lee

doi:10.1117/12.2608053

26 May 2022 Overlay stability control in IBO measurement using rAIM target

Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee

Author Affiliations +

Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 120530E (2022) https://doi.org/10.1117/12.2608053
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

In this paper, the rAIMTM (robust AIM) overlay target was investigated in terms of the stability versus the POR AIM® (Advanced Imaging Metrology) target used for imaging-based overlay (IBO) measurement at after development inspection (ADI). The targets were designed using KLA’s MTD AcuRate™, metrology target design software that performs simulations based on the optical properties related to relative permittivity and permeability about the material of each of the layers. Using advanced device layers, we studied the performance of the POR AIM target versus the newly designed rAIM target for imaging-based overlay measurements. For each target, we quantified the optical contrast, kernel signal, correctable modeled terms, total measurement uncertainty (TMU), and overlay (OVL) residuals from the modeled data through various wavelengths inside the Moiré effect regime in the case of rAIM. We demonstrate that there is an OVL measurement performance improvement using the rAIM target versus the POR AIM target. The measured optical properties of the rAIM target and comparison to the POR AIM target will be presented.

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Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, and Sangho Lee "Overlay stability control in IBO measurement using rAIM target", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 120530E (26 May 2022); https://doi.org/10.1117/12.2608053

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