Integrated simulations of hybrid discharge-laser produced plasma devices for EUV metrology

V. Sizyuk; A. Hassanein; F. Melsheimer; L. Juschkin; T. Sizyuk

doi:10.1117/12.2614327

26 May 2022 Integrated simulations of hybrid discharge-laser produced plasma devices for EUV metrology

V. Sizyuk, A. Hassanein, F. Melsheimer, L. Juschkin, T. Sizyuk

Proceedings Volume 12051, Optical and EUV Nanolithography XXXV; 120510R (2022) https://doi.org/10.1117/12.2614327
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

Discharge- and laser-produced plasma (DLPP) devices are being used as light sources for Extreme Ultraviolet (EUV) generation. A key challenge for both, DPP and LPP, is achieving sufficient brightness to support the throughput requirements of nanometrology tools. To simulate the environment of a hybrid DLPP device and optimize EUV output, we have developed an integrated HEIGHTS-DLPP computer simulation package. The package integrates simulation of two evolving plasmas (DPP & LPP) and includes modeling of a set of integrated self-consistent processes: external power source and plasma energy balance, plasma resistive magnetohydrodynamics (MHD), plasma heat conduction, detailed radiation transport (RT), and laser absorption and refraction. We simulated and optimized DLPP devices using Xe gas as a target material. We synchronized the external circuit parameters, chamber gas parameters and laser beam temporal and spatial profiles to achieve maximum EUV output. The full 3D Monte Carlo scheme was integrated for detailed RT and EUV output calculations in Xe using more than 3600 spectral groups. The modeling results are in good agreement with Julich Forschungszentrum experimental data. Theoretical models, developed and integrated in HEIGHTS package, showed wide capabilities and flexibility. The models and package can be used for optimization of the experimental parameters and settings, investigation of DLPP devices with complex design, analyzing the impact of integrated spatial effects and working timeline arrangement on the final EUV output, and EUV source size, shape and angular distribution.

Citation Download Citation

V. Sizyuk, A. Hassanein, F. Melsheimer, L. Juschkin, and T. Sizyuk "Integrated simulations of hybrid discharge-laser produced plasma devices for EUV metrology", Proc. SPIE 12051, Optical and EUV Nanolithography XXXV, 120510R (26 May 2022); https://doi.org/10.1117/12.2614327

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