Presentation + Paper
5 March 2022 SUNY Poly foundry process design kit: a unique design enablement platform for photonic integrated circuit design
Author Affiliations +
Proceedings Volume 12006, Silicon Photonics XVII; 120060I (2022) https://doi.org/10.1117/12.2608729
Event: SPIE OPTO, 2022, San Francisco, California, United States
Abstract
A novel process design kit (PDK) offering providing seamless access to the Albany NanoTech Complex’s 300mm foundry with a mission to promote silicon photonics technology is demonstrated. Unlike traditional pure-play foundries, we have developed a framework that allows our PDKs to contain libraries developed by internal and external domain experts. In addition to integrated Electronic Photonic Design Automation (EPDA) platforms, our PDK is also released in an alternate PIC design flow that the lowers the cost barrier for organizations. Further, our PDKs target a broad application space that includes telecom as well emerging areas such as sensors and quantum photonics – all with the ability for onboard light sources. A PDK from American Institute of Manufacturing (AIM Photonics) will be discussed that demonstrates these features.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Amit Dikshit, Jin Wallner, Barton Bergman, M. Rakib Uddin, Lewis G. Carpenter, Yukta P. Timalsina, Amir Begović, Chandra Casline Cotter, Nicholas M. Fahrenkopf, Christopher Baiocco, Gerald Leake Jr., and David L. Harame "SUNY Poly foundry process design kit: a unique design enablement platform for photonic integrated circuit design", Proc. SPIE 12006, Silicon Photonics XVII, 120060I (5 March 2022); https://doi.org/10.1117/12.2608729
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photonic integrated circuits

Integrated circuit design

Manufacturing

Nanotechnology

Sensors

Silicon photonics

Waveguides

RELATED CONTENT


Back to Top