The influence of oxygen partial pressure on the properties of evaporated alumina thin films

Tsion Teklemarim; Christopher J. Stolz; Matt Brophy; Michael Pierce; Pete Kupinski

doi:10.1117/12.2599213

19 November 2021 The influence of oxygen partial pressure on the properties of evaporated alumina thin films

Tsion Teklemarim, Christopher J. Stolz, Matt Brophy, Michael Pierce, Pete Kupinski

Proceedings Volume 11910, Laser-Induced Damage in Optical Materials 2021; 119100Y (2021) https://doi.org/10.1117/12.2599213
Event: SPIE Laser Damage, 2021, Online Only

Abstract

The effect of oxygen partial pressure on the properties of Al₂O₃ films deposited by electron beam evaporation has been investigated through a combination of spectrophotometric and interferometric characterization techniques. As oxygen partial pressure increases, a decrease in the refractive index is observed, as well as a shift towards less tensile films once they are exposed to ambient conditions. This decrease in tensile stress was observed to be correlated with water content in the films. Increasing oxygen partial pressure during deposition improved film stoichiometry, absorption, and laser induced damage threshold (LIDT) at 351 nm.

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Citation Download Citation

Tsion Teklemarim, Christopher J. Stolz, Matt Brophy, Michael Pierce, and Pete Kupinski "The influence of oxygen partial pressure on the properties of evaporated alumina thin films", Proc. SPIE 11910, Laser-Induced Damage in Optical Materials 2021, 119100Y (19 November 2021); https://doi.org/10.1117/12.2599213

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