High-brightness LDP EUV source for EUV mask inspection

Noritaka Ashizawa; Yoshihiko Sato; Hidenori Watanabe; Yusuke Teramoto; Takahiro Shirai; Shunichi Morimoto; Hironobu Yabuya; Kazuya Aoki; Daisuke Yajima; Akihisa Nagano

doi:10.1117/12.2600974

30 September 2021 High-brightness LDP EUV source for EUV mask inspection

Noritaka Ashizawa, Yoshihiko Sato, Hidenori Watanabe, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hironobu Yabuya, Kazuya Aoki, Daisuke Yajima, Akihisa Nagano

Author Affiliations +

Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540L (2021) https://doi.org/10.1117/12.2600974
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

The Laser-assisted Discharge-produced Plasma (LDP) EUV source has been developed as a light source for actinic mask inspection and beamline application and deployed in the field. LDP EUV source enables to generate high brightness with relatively larger EUV plasma by discharged plasma triggered by laser on one electrode disc which is coated by tin film. As EUVL process is used more in mass-production process, the requirement for EUV source for mask inspection is required more. USHIO LDP source has overcome various issues specialized from LDP source and realized high reliability 24/7 based operation with high brightness maintained.

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Noritaka Ashizawa, Yoshihiko Sato, Hidenori Watanabe, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hironobu Yabuya, Kazuya Aoki, Daisuke Yajima, and Akihisa Nagano "High-brightness LDP EUV source for EUV mask inspection", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540L (30 September 2021); https://doi.org/10.1117/12.2600974

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