High-NA EUV imaging: from system introduction towards low-k1 extension

Eelco van Setten; Jan Van Schoot; Anton van Oosten; Claire van Lare; Friso Wittebrood; Gijsbert Rispens; Gerardo Bottiglieri; John McNamara; Natalia Davydova; Jo Finders; Joerg Zimmermann; Bartosz Bilski; Paul Graeupner

doi:10.1117/12.2600965

28 September 2021 High-NA EUV imaging: from system introduction towards low-k1 extension

Eelco van Setten, Jan Van Schoot, Anton van Oosten, Claire van Lare, Friso Wittebrood, Gijsbert Rispens, Gerardo Bottiglieri, John McNamara, Natalia Davydova, Jo Finders, Joerg Zimmermann, Bartosz Bilski, Paul Graeupner

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Proceedings Volume 11854, International Conference on Extreme Ultraviolet Lithography 2021; 118540G (2021) https://doi.org/10.1117/12.2600965
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

To enable cost-effective shrink of future devices, a new High-NA EUV platform is being developed. The High-NA EUV scanner employs a novel POB design concept with 0.55NA that enables 8nm HP resolution and a high throughput. In this paper we will discuss the imaging performance and technology solutions to support our customers device roadmap from High-NA insertion towards low-k1 extension for critical Logic/MPU and DRAM layers. We will address various technology solutions that enable a high contrast through focus for decreasing feature size, such as mask stack optimization, computational litho solutions and advanced illumination shapes.

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Eelco van Setten, Jan Van Schoot, Anton van Oosten, Claire van Lare, Friso Wittebrood, Gijsbert Rispens, Gerardo Bottiglieri, John McNamara, Natalia Davydova, Jo Finders, Joerg Zimmermann, Bartosz Bilski, and Paul Graeupner "High-NA EUV imaging: from system introduction towards low-k1 extension", Proc. SPIE 11854, International Conference on Extreme Ultraviolet Lithography 2021, 118540G (28 September 2021); https://doi.org/10.1117/12.2600965

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KEYWORDS

Imaging systems

Extreme ultraviolet

Fiber optic illuminators

Extreme ultraviolet lithography

Metals

Mirrors

Optimization (mathematics)

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