Open Access Presentation
5 March 2021 SCIVAX Corporation: Nanoimprint Foundry and Application
Author Affiliations +
Abstract
SCIVAX Nanoimprint(Nanofabrication) Foundry Service Since Prof. Stephen Y. Cho and the group invented Nanoimprinting Lithography process in 1995. In this quarter century, Nanoimpriting process, tool and materials have been making significant advancement. Especially in the past few years, Nanoimprinting technology has been adopted as the key mass production technology in various advanced optical device application. As nanoimprinting has been gradually acknowledged as the essential production process technology, many players joined in this segment. Our focus has been on the development of the processes and NIL tools through interacting with the lead customers since the company founded in 2004. The accumulated know-how is indispensable asset to provide the quality foundry service. SCIVAX can offer the different level of service from the other ordinary foundry service providers. We provide an "one-stop solution" for nanofabrication service - optical simulation, mastering, prototyping to volume production foundry service. Wide variety of substrate type can be processed such as Silicon, Glass, Compound Semiconductor, Semiconductor Device Cercuit wafer, Plastic Film etc. For the size-wise, we can cover 2inch to 8inch(12inch service available in 2022). For the large area mother glass substrates, our offer is Nanoimprinting tool. We welcome you to contact anything about Nanoimpriting with SCIVAX., Application highlighted in the video: Diffusers and dot projectors for 3D sensing Nanofabrication on Si imaging devices Optical fingerprint sensors Wire grid inorganic Polarizer and Retarder Nano-patterns on compound semiconductor light-emitting devices such as deep-ultraviolet LEDs. and DFB lasers Two-dimensional photonic crystal structures Metasurfaces with high refractive index DNA sequencing chip
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masayo Izawa and Motohiko Tsuchiya "SCIVAX Corporation: Nanoimprint Foundry and Application", Proc. SPIE 11716, SPIE Exhibition Product Demonstrations, 1171625 (5 March 2021); https://doi.org/10.1117/12.2596069
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