Nanoprocessing of free-standing thin films by ultrafast laser ablation

Yuuki Uesugi; Yuichi Kozawa; Shunichi Sato

doi:10.1117/12.2587393

5 March 2021 Nanoprocessing of free-standing thin films by ultrafast laser ablation

Yuuki Uesugi, Yuichi Kozawa, Shunichi Sato

Author Affiliations +

Proceedings Volume 11674, Laser-based Micro- and Nanoprocessing XV; 116740O (2021) https://doi.org/10.1117/12.2587393
Event: SPIE LASE, 2021, Online Only

Abstract

In this paper, we demonstrated the processing of free-standing thin films by the ultrafast laser ablation, which has been difficult to process using existing nanoprocessing methods such as focused ion beam milling. First, we fabricated a holographic diffraction grating for transmission electron microscopy using a two-beam interference laser processing. We fabricated an electron phase hologram made of silicon with a thickness of 35 nm that generated electron vortex beams with high efficiency. Then, we demonstrated the laser processing of silicon nitride membranes with a thickness of 10 nm at near-threshold conditions and realized gratings with sub-100-nm structure. We believe that this technique will introduce a new nanoengineering technology using light because of its suitability for nanofilm processing and ease of use.

Conference Presentation

Citation Download Citation

Yuuki Uesugi, Yuichi Kozawa, and Shunichi Sato "Nanoprocessing of free-standing thin films by ultrafast laser ablation", Proc. SPIE 11674, Laser-based Micro- and Nanoprocessing XV, 116740O (5 March 2021); https://doi.org/10.1117/12.2587393

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