X-ray wavefront characterization with grating  interferometry using an x-ray microfocus laboratory source

Shuai Zhao; Ke-yi Wang; Guang-yu Cheng; Yuan Shen; Yu-shan Wang; Lei Zhang

doi:10.1117/12.2576152

25 August 2020 X-ray wavefront characterization with grating interferometry using an x-ray microfocus laboratory source

Shuai Zhao, Ke-yi Wang, Guang-yu Cheng, Yuan Shen, Yu-shan Wang, Lei Zhang

Proceedings Volume 11492, Advances in Metrology for X-Ray and EUV Optics IX; 114920Q (2020) https://doi.org/10.1117/12.2576152
Event: SPIE Optical Engineering + Applications, 2020, Online Only

Abstract

In this paper, we present an interferometric method to measure the shape of X-ray wavefront and the slope error of optical elements using microfocus x-ray source. According to the fractional Talbot effect, we built an x-ray grating interferometer for x-ray wavefront characterization at the working wavelength. The interferometer consists of a phase grating as a beam splitter and an absorption grating as a transmission mask for the detector. however, the determination of the relation between x-ray grating interferometer system parameters and the sensitivity, which is influenced by many optical elements in the system, is crucial for the optimization of the setup. It is very complicated to determine the best optical parameters in the course of experiment. The interferometry system is abstracted into a linear system, and then a mathematical model is constructed. The influence of different physical parameters, such as the source size and the energy spectrum, on the functional capability of an x-ray grating interferometer applied for X-ray wavefront characterization is discussed using numerical simulations based on Fresnel diffraction theory. The slope variations can be detected with an accuracy better than 100nrad.

Conference Presentation

Citation Download Citation

Shuai Zhao, Ke-yi Wang, Guang-yu Cheng, Yuan Shen, Yu-shan Wang, and Lei Zhang "X-ray wavefront characterization with grating interferometry using an x-ray microfocus laboratory source", Proc. SPIE 11492, Advances in Metrology for X-Ray and EUV Optics IX, 114920Q (25 August 2020); https://doi.org/10.1117/12.2576152

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