For non-ideal field-effect transistors (FETs) or thin-film transistors (TFTs), conventional current-voltage characterizations do not accurately probe charge transport, particularly for newly developed semiconductors. Here, we explore the device physics of non-uniformly accumulated FETs and develop the generalized gated four-probe (G-GFP) technique, which detects dynamic change in carrier accumulation and transport.
In experiments, FETs with controllable injection are fabricated and the G-GFP technique proves to avoid the errors brought about by conventional characterizations, to exclude the temperature-dependent injection, to detect in-situ the channel potential, and to clarify the gate-dependent mobility and origin of non-ideal characteristics.
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