Excitation selectivity in model tin-oxo resist: a computational chemistry perspective

Jonathan H. Ma; Han Wang; David Prendergast; Andrew Neureuther; Patrick Naulleau

doi:10.1117/12.2553055

8 April 2020 Excitation selectivity in model tin-oxo resist: a computational chemistry perspective

Jonathan H. Ma, Han Wang, David Prendergast, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113231F (2020) https://doi.org/10.1117/12.2553055
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

In this preliminary computational chemistry study, we report excitation selectivity in a model tin-oxo molecular resist. Upon impact ionization, organic side chains connected to 6-coordinated tin atoms (located near the charge balancing ligands) are preferentially destabilized. Upon electron addition, conversely, side chains connected to 5-coordinated tin atoms (located on the central belt) are destabilized. Inferring from the binding energies, the ionization induced processes likely have a smaller spatial extent than electron attachment induced process.

Conference Presentation

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Jonathan H. Ma, Han Wang, David Prendergast, Andrew Neureuther, and Patrick Naulleau "Excitation selectivity in model tin-oxo resist: a computational chemistry perspective", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231F (8 April 2020); https://doi.org/10.1117/12.2553055

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