Paper
20 December 2019 Controllability of refractive index of optical thin films and its application in antireflective coatings of multi-junction solar cells
Mengqi Shi, Linjie Bi
Author Affiliations +
Proceedings Volume 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019); 112095K (2019) https://doi.org/10.1117/12.2550799
Event: Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 2019, Xi'an, China
Abstract
The oblique angle incident deposition method is a novel method for preparing thin films. The vapor deposition of the film at different angles is used to change the structure of the material to control its refractive index, so that the selection of the optical film is more extensive. In this paper, the relationship between the deposition angle of the titanium oxide and silicon oxide materials in the oblique vapor deposition process and the refractive index of the film was studied by electron beam evaporation coating method using a self-made angle evaporation device. silicon oxide low refractive index film having a refractive index of 1.07 was obtained.Based on this, a refractive index gradual anti-reflection film for multi-junction GaAs solar cells with a weighted average reflectance of less than 2% was designed.
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Mengqi Shi and Linjie Bi "Controllability of refractive index of optical thin films and its application in antireflective coatings of multi-junction solar cells", Proc. SPIE 11209, Eleventh International Conference on Information Optics and Photonics (CIOP 2019), 112095K (20 December 2019); https://doi.org/10.1117/12.2550799
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KEYWORDS
Refractive index

Oxides

Silicon films

Silicon

Titanium

Antireflective coatings

Solar cells

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