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18 November 2019 Improvements of diffractive optical element uniformity and zero order performance using lithographic process parameter optimization method (withdrawal notice)
Guowei Zhang Sr., Xiaodong Yin Sr., Kehan Tian Sr.
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Proceedings Volume 11188, Holography, Diffractive Optics, and Applications IX; 111880X (2019) https://doi.org/10.1117/12.2535466
Event: SPIE/COS Photonics Asia, 2019, Hangzhou, China
Abstract
Publisher’s Note: This paper, originally published on 18 November 2019, was withdrawn on 25 August 2021 per author request.

Proceedings Volume 11188, Holography, Diffractive Optics, and Applications IX: 111880X (2019) https://doi.org/10.1117/12.2535466

Event: SPIE/COS Photonics Asia, 2019, Hangzhou, China

Online Publication Date: 18 November 2019

Withdrawn from Publication: 25 August 2021

Publisher’s Note: This conference presentation, originally published on 18 November 2019 was withdrawn on 25 August 2021 per author request.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Guowei Zhang Sr., Xiaodong Yin Sr., and Kehan Tian Sr. "Improvements of diffractive optical element uniformity and zero order performance using lithographic process parameter optimization method (withdrawal notice)", Proc. SPIE 11188, Holography, Diffractive Optics, and Applications IX, 111880X (18 November 2019); https://doi.org/10.1117/12.2535466
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KEYWORDS
Diffractive optical elements
Lithography
Critical dimension metrology
Diffraction
Optical alignment
Optical fabrication
Plasma etching
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