Research on photomask process for FPD

Kouichi Murakami; Takumi Uemura; Shuichi Ojima

doi:10.1117/12.2533422

27 June 2019 Research on photomask process for FPD

Kouichi Murakami, Takumi Uemura, Shuichi Ojima

Proceedings Volume 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology; 1117805 (2019) https://doi.org/10.1117/12.2533422
Event: Photomask Japan 2019, 2019, Yokohama, Japan

Abstract

FSCE focused on resist materials and coordinate correction technology for FPD mask and carried out research on underlying technology. The results we obtained are reported.

Citation Download Citation

Kouichi Murakami, Takumi Uemura, and Shuichi Ojima "Research on photomask process for FPD", Proc. SPIE 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117805 (27 June 2019); https://doi.org/10.1117/12.2533422

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