Open Access Paper
2 October 2019 Front Matter: Volume 11109
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 11109, including the Title Page, Copyright information, Table of Contents, Author and Conference Committee lists

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Advances in Metrology for X-Ray and EUV Optics VIII, edited by Lahsen Assoufid, Haruhiko Ohashi, Anand Asundi, Proceedings of SPIE Vol. 11109 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510629110

ISBN: 9781510629127 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Akgoz, S. Asli, 02

Alcock, Simon G., 06, 0A, 0E, 0F

Arnold, Thomas, 0M

Assoufid, Lahsen, 0C, 0K

Badami, Vivek, 0E

Bazan da Silva, Murilo, 06

Black, Gillian, 0G

Bouet, Nathalie, 09

Broers, C., 0F

Bryant, Diane, 0C

Buchheim, Jana, 0N

Burian, T., 0F

Byman, V., 03

Cai, Quan, 0O

Carley, R., 0F

Cascella, M., 0F

Chalupský, J., 0F

Chao, Weilun, 0C

Chen, Bo-Yi, 0Q

Cocco, Daniele, 0C

Cui, Xiaoyu, 0G

Delitz, J. T., 0F

Eisebitt, S., 0F

Fung, Hok-Sum, 0Q

Geckeler, Ralf D., 02, 03

Gerasimova, N., 0F

Goldberg, Kenneth A., 0C

Gorovikov, Sergey, 0G

Grizolli, Walan, 0C, 0K

Grubert, Bernd, 02

Gwalt, Grzegorz, 0N

Hájková, V., 0F

Hand, Matthew, 0A

Hardin, Corey, 0C

He, Feizhu, 0G

Heikkinen, V., 03

Henneberg, Grant, 0G

Hillman, Michael, 0A

Hsu, Ming-Ying, 0Q

Huang, Lei, 09, 0C

Huang, Yu-Shan, 0Q

Idir, Mourad, 09, 0C

Islam, Zahirul, 0K

Juha, L., 0F

Just, Andreas, 02, 03

Kearney, Steve P., 0C

Krause, Michael, 02, 03

Kreitschik, David, 02

Kuhne, Dennis, 09

La Civita, D., 04, 0F

Lacey, Ian, 0M

Lassila, A., 03

Le Guyarder, L., 0F

Lee, Chien-yu, 0Q

Lee, Lance, 0C

Li, Dahai, 0P

Li, Ming, 0O

Lin, Shang-Wei, 0Q

Littlewood, Richard, 0A

Liu, Peng, 0O

MacDonald, Michael A., 0G

Madsen, A., 0B

Martin, I. Frejio, 04, 0B

Mercadier, L., 0F

Mercurio, G., 0F

Mimura, Hidekazu, 0I

Moriconi, Simone, 0A

Morton, Daniel, 0C

Nagai, Yukie, 0I

Ng, May Ling, 0C

Nistea, Ioana-Theodora, 06, 0E, 0F

Ohtake, Yutaka, 0I

Paetzelt, Hendrik, 0M

Pfau, B., 0F

Rebuffi, Luca, 0K

Reich, A., 0F

Rochester, Simon, 0M

Sawhney, Kawal, 06, 0A, 0E

Scherz, A., 0F

Schlappa, J., 0F

Schmidtchen, S., 04, 0B

Schnabel, Olaf, 02

Schneider, M., 0F

Schumann, Matthias, 02, 03

Setoodehnia, K., 0F

Sheng, Weifan, 0O

Shi, Xianbo, 0C, 0K

Shimizu, Satsuki, 0I

Shpak, M., 03

Shu, Deming, 0C, 0K

Shvyd’ko, Yuri, 0C

Siewert, Frank, 02, 0M, 0N

Signorato, Riccardo, 0E

Sinn, H., 04, 0F

Störmer, M., 0B

Takacs, Peter Z., 0M

Takeo, Yoko, 0I

Tayabaly, Kashmira, 09

Teichmann, M., 0F

Vannoni, M., 04, 0B, 0F

Vescovi, Matthew, 09

Viefhaus, Jens, 0N

Vozda, V., 0F

Vyšín, L., 0F

Wang, Duan-Jen, 0Q

Wang, Hongchang, 0A

Wang, Ruiyang, 0P

Wang, Tianyi, 09

Wojcik, Michael, 0C

Wojdyla, Antoine, 0C

Yamaguchi, Gota, 0I

Yandayan, Tanfer, 02

Yang, Fugui, 0O

Yaroslavtsev, A., 0F

Yashchuk, Valeriy V., 0M

Yates, Brian, 0G

Yin, Gung-Chian, 0Q

Zhang, Xiaowei, 0O

Zozulya, A., 0B

Zuin, Lucia, 0G

Conference Committee

Program Track Chairs

  • Ali M. Khounsary, Illinois Institute of Technology (United States)

  • Ralph B. James, Savannah River National Laboratory (United States)

Conference Chairs

  • Lahsen Assoufid, Argonne National Laboratory (United States)

  • Haruhiko Ohashi, RIKEN SPring-8 Center (Japan)

  • Anand Krishna Asundi, Nanyang Technological University (Singapore)

Conference Program Committee

  • Simon G. Alcock, Diamond Light Source Ltd. (United Kingdom)

  • Raymond Barrett, ESRF - The European Synchrotron (France)

  • Daniele Cocco, Lawrence Berkeley National Laboratory (United States)

  • Uwe Flechsig, Paul Scherrer Institut (Switzerland)

  • Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt (Germany)

  • Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

  • Mikhail V. Gubarev, NASA Marshall Space Flight Center (United States)

  • Christian F. Guertin, Vermont Photonics Technologies Corporation (United States)

  • Yu-Shan Huang, National Synchrotron Radiation Research Center (Taiwan)

  • Mourad Idir, Brookhaven National Laboratory (United States)

  • Weiguo Liu, Xi’an Technological University (China)

  • Jonathan Manton, Inprentus, Inc. (United States)

  • Hidekazu Mimura, The University of Tokyo (Japan)

  • Josep Nicolas, ALBA Synchrotron (Spain)

  • Lorenzo Raimondi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)

  • Rajdeep Singh Rawat, National Institute of Education (Singapore)

  • Kawal J. S. Sawhney, Diamond Light Source Ltd. (United Kingdom)

  • Frank Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)

  • Regina Soufli, Lawrence Livermore National Laboratory (United States)

  • Peter Z. Takacs, Brookhaven National Laboratory (United States)

  • Muriel Thomasset, Synchrotron SOLEIL (France)

  • Maurizio Vannoni, European XFEL GmbH (Germany)

  • Amparo Vivo, ESRF - The European Synchrotron (France)

  • Zhanshan Wang, Tongji University (China)

  • Kazuto Yamauchi, Osaka University (Japan)

  • Tanfer Yandayan, TUBITAK UME (Turkey)

  • Valeriy V. Yashchuk, Lawrence Berkeley National Laboratory (United States)

  • Brian W. Yates, Canadian Light Source Inc. (Canada)

Session Chairs

  • 1 Calibration Tools and Methods

    Lahsen Assoufid, Argonne National Laboratory (United States)

  • 2 Facilities

    Frank Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)

  • 3 Optics Fabrication and Testing

    Haruhiko Ohashi, RIKEN SPring-8 Center (Japan)

  • 4 Optical Systems and Their Metrology

    Lahsen Assoufid, Argonne National Laboratory (United States)

  • 5 At-Wavelength Metrology

    Haruhiko Ohashi, RIKEN SPring-8 Center (Japan)

  • 6 Profilometry and Application

    Anand Asundi, Nanyang Technological University (Singapore)

  • 7 Subaperture Stitching

    Kazuto Yamauchi, Osaka University (Japan)

© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 11109", Proc. SPIE 11109, Advances in Metrology for X-Ray and EUV Optics VIII, 1110901 (2 October 2019); https://doi.org/10.1117/12.2551651
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KEYWORDS
Metrology

Mirrors

Synchrotron technology

Synchrotrons

Light sources

X-ray optics

Calibration

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