Electronic and optical properties of MoS2 thin films deposited by magnetron sputtering studying

A. I. Belikov; Kyaw Zin Phyo; V. N. Kalinin; A. I. Semochkin

doi:10.1117/12.2512203

15 March 2019 Electronic and optical properties of MoS₂ thin films deposited by magnetron sputtering studying

A. I. Belikov, Kyaw Zin Phyo, V. N. Kalinin, A. I. Semochkin

Proceedings Volume 11022, International Conference on Micro- and Nano-Electronics 2018; 110221F (2019) https://doi.org/10.1117/12.2512203
Event: The International Conference on Micro- and Nano-Electronics 2018, 2018, Zvenigorod, Russian Federation

Abstract

Molybdenum disulfide (MoS₂) thin films were prepared by magnetron sputtering MoS₂ (99.9% purity) target at the different substrates (such as sapphire and silicon) at the various argon pressure and power discharge. Deposition parameters influence on the structure and optical properties of the MoS₂ thin films were analyzed by atomic force microscope (AFM) and spectrophotometer that was used for detecting reflectance spectra and then to calculate thin films bandgap. MoS₂ thin films on sapphire substrates have smoother surface roughness and higher bandgap energy than MoS₂ thin films on Si substrate. MoS₂ thin films bandgap energy increasing and surface roughness decreasing was caused by power discharge decreasing.

Citation Download Citation

A. I. Belikov, Kyaw Zin Phyo, V. N. Kalinin, and A. I. Semochkin "Electronic and optical properties of MoS₂ thin films deposited by magnetron sputtering studying", Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221F (15 March 2019); https://doi.org/10.1117/12.2512203

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