Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch

Benjamin Vincent; S. Lariviere; C. Wilson; R. H. Kim; J. Ervin

doi:10.1117/12.2518099

20 March 2019 Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch

Benjamin Vincent, S. Lariviere, C. Wilson, R. H. Kim, J. Ervin

Author Affiliations +

Proceedings Volume 10963, Advanced Etch Technology for Nanopatterning VIII; 109630Q (2019) https://doi.org/10.1117/12.2518099
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

This paper uses Virtual Fabrication to assess the imec 7 nm node (iN7) Self-Aligned Quadruple Patterning (SAQP) integration scheme for the 16 nm half-pitch Metal 2 line formation. We present first the technical challenge of obtaining defect-free M2 lines with SAQP, and then provide a solution to achieve a <1% failure rate using a combination of Advanced Process Control and Virtual Fabrication.

Conference Presentation

Citation Download Citation

Benjamin Vincent, S. Lariviere, C. Wilson, R. H. Kim, and J. Ervin "Virtual fabrication and advanced process control improve yield for SAQP process assessment with 16 nm half-pitch", Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 109630Q (20 March 2019); https://doi.org/10.1117/12.2518099

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