Metal organic cluster photoresists: new metal oxide systems

Kazunori Sakai; Seok-Heon Jung; Wenyang Pan; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2515148

20 March 2019 Metal organic cluster photoresists: new metal oxide systems

Kazunori Sakai, Seok-Heon Jung, Wenyang Pan, Emmanuel P. Giannelis, Christopher K. Ober

Proceedings Volume 10963, Advanced Etch Technology for Nanopatterning VIII; 1096306 (2019) https://doi.org/10.1117/12.2515148
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography, using 13.5 nm radiation, is a prominent candidate for next generation manufacturing. Our main effort has recently focused on metal organic cluster photoresists, including both Zr and Hf metal oxides, both relatively low EUV absorbing metals. However, integration of high EUV absorption elements is now considered to be a more promising route to further improve lithographic performance under EUV radiation. Here, we report lithography of zinc oxide-based metal organic cluster photoresists, and EUV patterning below 15 nm. The lithographic performance of this and other metal oxides is described and etch characteristics discussed.

Conference Presentation

Citation Download Citation

Kazunori Sakai, Seok-Heon Jung, Wenyang Pan, Emmanuel P. Giannelis, and Christopher K. Ober "Metal organic cluster photoresists: new metal oxide systems", Proc. SPIE 10963, Advanced Etch Technology for Nanopatterning VIII, 1096306 (20 March 2019); https://doi.org/10.1117/12.2515148

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