Presentation + Paper
27 March 2019 ToF-SIMS analysis of antimony carboxylate EUV photoresists
Michael Murphy, Shaheen Hasan, Steven Novak, Greg Denbeaux, Robert L. Brainard
Author Affiliations +
Abstract
Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) is used to evaluate the composition of nonvolatile photoproducts created by EUV photolysis of antimony carboxylate photoresists [R3Sb(O2CR′)2]. Dozens of potential photoproduct ions were identified using exact mass and 121Sb/123Sb isotopic ratios. Several oxygen-rich antimony ions were found to increase in abundance with exposure. Two methods were employed to identify photoproducts which create solubility contrast. First, samples were analyzed pre- and post-development to examine the effects of EUV exposure and developer solvent on secondary ion intensity. Secondly, changes in intensity of select ions were compared to dissolution contrast over a range of doses. Through these studies, ion intensities were found to correlate with dissolution contrast for several fragments, indicating their active role in creating negative-tone response.
Conference Presentation
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Michael Murphy, Shaheen Hasan, Steven Novak, Greg Denbeaux, and Robert L. Brainard "ToF-SIMS analysis of antimony carboxylate EUV photoresists", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096010 (27 March 2019); https://doi.org/10.1117/12.2516011
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KEYWORDS
Antimony

Ions

Extreme ultraviolet lithography

Photoresist materials

Oxides

Photoresist developing

Extreme ultraviolet

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