Large-area UV processing with a novel 248nm line beam system

Ralph Delmdahl; Matthias Trenn; Christian Hördemann; Arnold Gillner

doi:10.1117/12.2508268

27 February 2019 Large-area UV processing with a novel 248nm line beam system

Ralph Delmdahl, Matthias Trenn, Christian Hördemann, Arnold Gillner

Proceedings Volume 10911, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VIII; 1091106 (2019) https://doi.org/10.1117/12.2508268
Event: SPIE LASE, 2019, San Francisco, California, United States

Abstract

A novel UV line beam system for large area processing is introduced. The linear beam concept dispenses with movable components such as scanner optics. By using a fixed line beam with ns pulse duration and combining it with a 150 W excimer laser as the beam source a system with optimum reproducibility of the resulting layer modification has been created. Depending on the application, the excimer laser beam can be redirected into a high-resolution mask ablation system with rectangular field geometry. This machine’s modular concept can be used for a wide range of materials and laser-processes, especially for large area applications. Two different laser-material processes, thermal ablation and optical modification, are presented demonstrating the variety of the possible functionality of the system.

Conference Presentation

Citation Download Citation

Ralph Delmdahl, Matthias Trenn, Christian Hördemann, and Arnold Gillner "Large-area UV processing with a novel 248nm line beam system", Proc. SPIE 10911, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VIII, 1091106 (27 February 2019); https://doi.org/10.1117/12.2508268

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