Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power

P. Oesterlin; P. Lokai; B. Burghardt; W. Muckenheim; H.-J. Kahlert; D. Basting

doi:10.1117/12.953168

25 July 1989 Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power

P. Oesterlin, P. Lokai, B. Burghardt, W. Muckenheim, H.-J. Kahlert, D. Basting

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953168
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A commercial Lambda 248 L excimer system has been equipped with a newly developed wavemeter. The self-controlling laser system can be stabilized at a pre-selected wavelength in the range of 248.180 to 248.580 nm with an absolute accuracy of ± 0.001 nm. Due to the deep-UV stepper optics the wavelength can be adjusted absolutely to comply with different optics. The modified 248 L-system can be operated at an average power of up to 5 W. Experimental results are presented.

Citation Download Citation

P. Oesterlin, P. Lokai, B. Burghardt, W. Muckenheim, H.-J. Kahlert, and D. Basting "Advanced Lithography Excimer System: Absolute Wavelength Adjustment, Five Watt Average Power", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953168

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