Optical Phase-Shifting Technique For Submicron Linewidth Measurement: Simulations And Measurements

Yiping Xu; Evelyn Hu; Susan Hackwood; Glen Wade

doi:10.1117/12.953108

19 July 1989 Optical Phase-Shifting Technique For Submicron Linewidth Measurement: Simulations And Measurements

Yiping Xu, Evelyn Hu, Susan Hackwood, Glen Wade

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953108
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

We have proposed a novel phase-shifting and Fourier transform technique for linewidth measurement. The novelty of the technique is the transfer of linewidth information into the zero-order spatial frequency component of the image. The method we proposed incorporates phase-cancellation and spatial Fourier transform to achieve resolution beyond the Rayleigh diffraction limit and should be applicable for metrology of sub-micron features. Theoretical analyses have shown that this technique will be viable well into the submicron range. Experimental measurements have been made on different features having relatively large dimensions (~ 100 μm) to verify the theory. Experimental results have demonstrated the validity of the concept and given the directions of practical limitations and requirements of the approach in order to obtain true submicron linewidth measurement. Such limitations include consideration of the precision of lateral translation of phase mask with respect to substrate, and of the mask to substrate distance. Further, extensive simulations of the robustness of this technique with respect to material composition, contrast and feature morphology (slope and height of the linewidth features) have been carried out for both individual and periodic features.

Citation Download Citation

Yiping Xu, Evelyn Hu, Susan Hackwood, and Glen Wade "Optical Phase-Shifting Technique For Submicron Linewidth Measurement: Simulations And Measurements", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953108

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KEYWORDS

Photomasks

Reflectivity

Phase shifts

Metrology

Inspection

Integrated circuits

Spatial frequencies

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