Recent advances in rapid polishing process of large aperture optical flats

Ruiqing Xie; Shijie Zhao; Defeng Liao; Xianhua Chen; Jian Wang; Qiao Xu; Huiying Zhao; Zhuangde Jiang

doi:10.1117/12.2505131

30 January 2019 Recent advances in rapid polishing process of large aperture optical flats

Ruiqing Xie, Shijie Zhao, Defeng Liao, Xianhua Chen, Jian Wang, Qiao Xu, Huiying Zhao, Zhuangde Jiang

Proceedings Volume 10841, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Meta-Surface-Wave and Planar Optics; 108410V (2019) https://doi.org/10.1117/12.2505131
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

A full aperture rapid polishing process (RPP) have been developed for batch producing high-precision large aperture optical flats required in some extreme application, such as high power laser, extreme ultraviolet lithography. Combining the theory of ultra-precision machine and chemical mechanical polishing, RPP can polish out the large aperture flat optical components in several hours or less. The material removal rate of fused silica component can be enhanced to ≥12 μm/h in RPP, which polishing efficiency is more than ten times of traditional pitch polishing process. The surface roughness also can be down to 0.3nm (RMS). Through several process improvements, the surface figure is determinately controlled, and subsurface damage can be quickly removed and suppressed. At last, high accuracy optical components can be obtained with high flatness (sub-micron), super smooth (sub-nanometer), and near-zero defects (SSD density ≤0.02 def/cm² ).

Citation Download Citation

Ruiqing Xie, Shijie Zhao, Defeng Liao, Xianhua Chen, Jian Wang, Qiao Xu, Huiying Zhao, and Zhuangde Jiang "Recent advances in rapid polishing process of large aperture optical flats", Proc. SPIE 10841, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Meta-Surface-Wave and Planar Optics, 108410V (30 January 2019); https://doi.org/10.1117/12.2505131

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KEYWORDS

Polishing

Surface finishing

Optical components

Silica

Surface roughness

Optics manufacturing

Chemical mechanical planarization

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